Ruthenium oxide and strontium ruthenate electrodes for ferroelectric thin-films capacitors

Applied Physics A: Materials Science and Processing

Volumn 70, Issue 2, 2000, Pages 239-242

  Hartmann, A J ^a   Neilson, M ^a   Lamb, R N ^a   Watanabe, K ^b   Scott, J F ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; FERROELECTRIC DEVICES; LEAKAGE CURRENTS; OXIDATION; PHOTOELECTRON SPECTROSCOPY; POLYCRYSTALLINE MATERIALS; POSITIVE IONS; RUTHENIUM COMPOUNDS; STRONTIUM COMPOUNDS; SURFACE STRUCTURE; THIN FILMS;

FERROELECTRIC JUNCTIONS; FERROELECTRIC THIN FILM CAPACITOR; FILM ELECTRODE LAYER STRUCTURE; RUTHENIUM OXIDE; STRONTIUM RUTHENATE ELECTRODES;

ELECTRODES;

EID: 0034138368     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050041     Document Type: Article

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