Second generation liquid source misted chemical deposition (LSMCD) technology for ferroelectric thin films

Integrated Ferroelectrics

Volumn 18, Issue 1-4, 1997, Pages 127-136

  Solayappan, Narayan ^a   Mcmillan, Larry D ^a   Paz De Araujo, Carlos A ^a   Grant, Bob ^b  

^a Symetrix Corporation   (United States)

^b SubMicron Systems Corp   (United States)

Author keywords

Chemical Solution Deposition; LSMCD; SBT; Thin Films

Indexed keywords

ELECTRIC PROPERTIES; FERROELECTRIC MATERIALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY; STRONTIUM COMPOUNDS; THIN FILMS;

FERROELECTRIC THIN FILM; LIQUID SOURCE MISTED CHEMICAL DEPOSITION;

DIELECTRIC FILMS;

EID: 0031357873     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708221693     Document Type: Article

References (5)

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5. N. Solayappan, G. F. Derbenwick, L. D. McMillan, C. P. Araujo and S. Hayashi, Integrated Ferroelectrics, 14, 237 (1997).