Creating 3D structures with a direct-write gray-scale photomask made from Sn/In bimetallic films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5339, Issue , 2004, Pages 321-332

  Chapman, Glenn ^a   Tu, Yuqiang ^a   Peng, Jun ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Bimetallic Thin Film; Direct write photomask; Gray scale photomask; Thermal Resist

Indexed keywords

EUTECTICS; LIGHT ABSORPTION; OXIDATION; PHOTORESISTORS; PLASMA ETCHING; SILICA; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BIMETALLIC THIN FILM; DIRECT-WRITE PHOTOMASK; GREAY-SCALE PHOTOMASK; THERMAL RESIST;

METALLIC FILMS;

EID: 5444249176     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.529492     Document Type: Conference Paper

References (29)

1. T. Bourouina, et al, "The MEMSNAS process: microloading effect for micromachining of 3D structures with nearly arbitrary shape", IEEE/LEOS Optical MEMS, pp 25-28, 2001.
2. T-K A. Chou and K. Najafi, "Fabrication of out-of-plane curved surfaces in Si by utilizing RIE lag", IEEE Int. Conf. on Micro Electro Mechanical Systems (MEMS 2002) pp 145-148, 2002.
3. A. A. Ayon, et al, "Tailoring etch directionality in a deep reactive ion etching tool", J. Vac. Sci. Technol. 18 pp 1412-1416, 2000.
4. C. Beuret, et al, "Microfabrication of 3D multidirectional inclined structures by UV lithography and electroplating", Proc. IEEE Int. Conf. on Micro Electro Mechanical Syst. (MEMS 1994), pp 81-85, 1994.
5. A. Bertsch A. H. Lorenz and P. Renaud, "Combining microstereolithography and thick resist UV lithography for 3D microfabrication", IEEE 11th Annual Int. Workshop on Micro Electro Mechanical Systems (MEMS 1998) pp 18-23, 1998.
6. D. C. O'Shea and W. S. Rockward, "Gray-scale masks for diffractive-optics fabrication: II. Spatially filtered halftone screens", Appl. Opt. 34, pp 7518, 1995.
7. W. Daschner, P. Long, M. Larsson and S. H. Lee, "Fabrication of diffractive optical elements using a single optical exposure with a gray level mask", J. Vac. Sci. Technol. B 13, (6) pp 2729, 1995.
8. B. Wagner, H. J. Quenzer, W. Henke, W. Hoppe and W. Pilz, "Microfabrication of complex surface topographies using grey-tone lithography", Sensors and Actuators A: Physical 46, pp 89, 1995.
9. G. Gal, US Patent 5482800, 9 January 1996.
10. Barry Block, et al, US Patent No. 6033766, Mar 2000.
11. Chuck Wu, US Patent Nos. 4567104, 4670366, 4894303, 5078771 and 5285517.
12. M. V. Sarunic, G. H. Chapman, Y. Tu, "A Prototype Laser Activated Bimetallic Thermal Resist For Microfabrication", Proc. SPIE Vol. 4274, pp 183-193, January, 2001.
13. G. H. Chapman, Y. Tu, M. V. Sarunic, "Biln: a Sensitive Bimetallic Thermal Resist", Proc. SPIE Vol. 4345, pp 557-568, 2001.
14. G.H. Chapman, Y. Tu, and M.V. Sarunic " Bi/In Bimetallic Thermal Resists for Microfabrication, Photomasks and Micromachining Applications", Proc. SPIE Vol. 4690, pp 465-476, San Jose, CA, Mar., 2002.
15. Glenn Chapman, Yuqiang Tu, James Dykes, Masahiko Mio and Jun Peng, "Creating Direct-write Gray-scale Photomasks with Bimetallic Thin Film Thermal Resists", SPIE BACUS, Monterey, Sept., 2003. (accepted)
16. Y. Tu, G.H. Chapman, and M.V. Sarunic. "Bimetallic Thermally Activated Films for Microfabrication, Photomasks and Data Storage", Proc. SPIE Vol. 4637, pp 330-340, 2002.
17. G. H. Chapman, M. V. Sarunic, Y Tu, "Dry Multilayer Inorganic Alloy Thermal Resist for Lithographic Processing and Image Creation", US patent 6,641,978, November 4, 2003.
18. 2 Plasma Etching", SPIE Photonics West - Micromachining and Microfabrication, San Jose, Jan., 2004. (accepted)
19. Max Hansen, "Constitution of binary alloys", McGraw-Hill, 1958.
20. G. Chapman and Y. Tu, "Single Step Direct-Write Photomask Made From Bimetallic Bi/In Thermal Resist", presented in SPIE Photonics West - LASE, San Jose, 2003.
21. K. Suzuki, S. Matsui and Y. Ochiai, "Sub-Half-Micron Lithography for ULSIs", Cambridge University Press, 2000.
22. E. Elizur and D. Gelbart, "Thermal transfer for flat-panel-display manufacturing", Journal of the Society for Information Display, Vol 11, No. 1, pp 199-202, 2003.
23. Y. Tu, M. Karimi, N. Morawej, W. N. Lennardl, T. W. Simpsonl, J. Peng, K. L. Kavanagh, and G. H. Chapman, "Wavelength-Invariant Resist Composed of Bimetallic Layers", presented in MRS Fall Meeting, Boston, 2002.
24. Lynn Davis, "Properties of transparent conducting oxides deposited at room temperature", Thin Solid Films, Vol. 236, Issues 1-2, Pages 1-5, 15 December 1993.
25. D. V. Morgan, Y. H. Aliyu, R. W. Bunce and A. Salehi, "Annealing effects on opto-electronic properties of sputtered and thermally evaporated indium-tin-oxide films", Thin Solid Films, Vol. 312, Issues 1-2, Pages 268-272, 14 January 1998.
26. A. Salehi, "The effects of deposition rate and substrate temperature of ITO thin films on electrical and optical properties", Thin Solid Films, Vol. 324, Issues 1-2, Pages 214-218, 1 July 1998.
27. Yeon Sik Jung and Sung Soo Lee, "Development of indium tin oxide film texture during DC magnetron sputtering deposition", Journal of Crystal Growth, Vol. 259, Issue 4, Pages 343-351, December 2003.
28. Young-Chul Park, Young-Soon Kim, Hyung-Kee Seo, S.G. Ansari and Hyung-Shik Shin, "ITO thin films deposited at different oxygen flow rates on Si(100) using the PEMOCVD method", Surface and Coatings Technology 161, p 62-69, 2002.
29. E. Terzini, P. Thilakan and C. Minarini, "Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature", Materials Science and Engineering, B77, pp 110-114, 2000.