Bimetallic thermal activated films for microfabrication, photomasks and data storage

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4637, Issue , 2002, Pages 330-340

  Tu, Yuqiang ^a   Chapman, Glenn ^a   Sarunic, Marinko ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Cu plating; Inorganic photoresist; Microlithography; Photomask; Thermal Resist

Indexed keywords

BIMETALS; HEAT TREATMENT; LIGHT ABSORPTION; LIGHT REFLECTION; MASKS; METALLIC FILMS; NEODYMIUM LASERS; OPTICAL DATA STORAGE; SILICON WAFERS;

PHOTOMASKS;

PHOTORESISTS;

EID: 0036403668     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.470639     Document Type: Conference Paper

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