Bi/In bimetallic thermal resists for microfabrication, photomasks and micromachining applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 465-476

  Chapman, Glenn ^a   Tu, Yuqiang ^a   Sarunic, Marinko V ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Inorganic photoresist; Microlithography; Thermal Resist

Indexed keywords

BISMUTH COMPOUNDS; ELECTROPLATING; MASKS; MICROMACHINING; NITRIC ACID; SILICON WAFERS; SUBSTRATES; THIN FILMS;

PHOTOMASKS;

PHOTORESISTS;

EID: 0036030909     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474201     Document Type: Conference Paper

References (12)

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3. M.V. Sarunic, Master Thesis "Bi/In: A prototype Bimetallic Laser Activated Thermal Inorganic Resist for Microlithography", Chapter 3, School of Engineering Science, Simon Fraser University, 2001.
4. G.H. Chapman, M.V. Sarunic, Y. Tu, "Dry Multilayer Inorganic Alloy Thermal Resist for Lithographic Processing and Image Creation", PCT patent application WO 02/06897 A2, applied for Jan 24, 2002.
5. M. Hansen, Constitution of binary alloys, McGraw-Hill, 1958.
6. G.H. Chapman, Y. Tu, M.V. Sarunic, "BiIn: a Sensitive Bimetallic Thermal Resist", Proceedings SPIE Advances in Resist Technology and Processing XVIII, Vol. 4345, 557-568, (2001).
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8. M.V. Sarunic, Master Thesis "Bi/In: A prototype Bimetallic Laser Activated Thermal Inorganic Resist for Microlithography", Chapter 2, School of Engineering Science, Simon Fraser University, 2001.
9. Y. Tu, G.H. Chapman, and M.V. Sarunic. "Bimetallic Thermally Activated Films for Microfabrication, Photomasks and Data Storage", accepted by SPIE Photonics West, Laser Applications in Microelectronics and Optoelectronics Applications, San Jose, CA 2002.
10. D. Gelbart and V.A. Karasyuk, "UV thermoresists: sub-100-nm imaging without proximity effects", Proc. SPIE Vol. 3676, p. 786-793, March 1999.
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12. W. Ehrfeld, F. Gotz, D. Munchmeyer, W. Schelb, and D. Schmidt, "LIGA Process: Sensor Construction Techniques Via Xray Lithography," Tech. Digest of Solid-State Sensor and Actuator Workshop, Hilton Head, SC, pp. 1-4, June 1998.