BiIn: A sensitive bimetallic thermal resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 557-568

  Chapman, G ^a   Tu, Y ^a   Sarunic, M ^a   Dhaliwal, J ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Inorganic photoresist; Microlithography; Thermal Resist

Indexed keywords

BIMETALS; EUTECTICS; LIGHT REFLECTION; METALLIC FILMS; PHASE DIAGRAMS; POLYCRYSTALLINE MATERIALS; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

THERMAL RESISTS;

PHOTORESISTS;

EID: 0034765777     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436888     Document Type: Conference Paper

References (13)

1. Top surface imaging resists for EUV lithography
2. 3: A high-contrast, top-surface imaging resist for 193 nm lithography
3. Process optimization of a negative-tone CVD photoresist for 193 nm lithography applications
4. Aluminum oxides as imaging materials for 193-nm excimer laser lithography
5. UV thermoresists: Sub-100-nm imaging without proximity effects
6. Plasma-deposited amorphous carbon films as planarization layers
7. 3