Low-voltage electron beam lithography resist processes: Top surface imaging and hydrogen silisesquioxane bilayer

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 3, 2004, Pages 442-449

  Jamieson, Andrew ^a   Willson, C Grant ^a   Hsu, Yautzong ^b   Brodie, Alan D ^b  

^a The University of Texas at Austin   (United States)

^b Etec Systems Inc   (United States)

Author keywords

Base quenchers; Bilayer lithography; Electron beam lithography; Hydrogen silsesquioxane; Top surface imaging

Indexed keywords

BASE QUENCHERS; BILAYER LITHOGRAPHY; HYDROGEN SILSESQUIOXANE; TOP SURFACE IMAGING;

EDGE DETECTION; ELECTROMAGNETIC WAVE BACKSCATTERING; ELECTRON BEAMS; MASKS; ROUGHNESS MEASUREMENT;

ELECTRON BEAM LITHOGRAPHY;

EID: 5444243974     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1758268     Document Type: Conference Paper

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