Si lattice parameter measurement by centimeter X-ray interferometry

Optics Express

Volumn 16, Issue 21, 2008, Pages 16877-16888

  Ferroglio, Luca ^a,b   Mana, Giovanni ^b   Massa, Enrico ^a  

^a POLITECNICO DI TORINO   (Italy)

^b ISTITUTO NAZIONALE DI RICERCA METROLOGICA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

LATTICE CONSTANTS;

LATTICE PARAMETER MEASUREMENT; MADE-TO-MEASURE; OPTICAL INTERFEROMETER; RELATIVE UNCERTAINTY; SI CRYSTALS; TEST MEASUREMENTS; X-RAY INTERFEROMETRY;

OPTICAL LATTICES;

NANOMATERIAL; SILICON;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; INTERFEROMETRY; MATERIALS TESTING; ULTRASTRUCTURE; X RAY CRYSTALLOGRAPHY;

CRYSTALLOGRAPHY, X-RAY; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; INTERFEROMETRY; MATERIALS TESTING; NANOSTRUCTURES; SILICON;

EID: 54249124478     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.016877     Document Type: Article

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