Scanning X-Ray interferometry over a millimeter baseline

IEEE Transactions on Instrumentation and Measurement

Volumn 46, Issue 2, 1997, Pages 576-579

  Bergamin, Angelo ^a   Cavagnero, Giovanni ^a   Cordiali, Laura ^b   Mana, Giovanni ^a   Zosi, Gianfranco ^c  

^a Istituto di Metrologia Gustavo Colonnetti   (Italy)

^b POLITECNICO DI TORINO   (Italy)

^c UNIVERSITY OF TURIN   (Italy)

Author keywords

Nanotechnology; Optical interferometry; Precision measurements; Silicon lattice parameter; Translation devices; X ray interferometry

Indexed keywords

CRYSTAL LATTICES; CRYSTAL ORIENTATION; INTERFEROMETRY; NANOTECHNOLOGY; SERVOMECHANISMS;

CRYSTAL MOVEMENT; LATTICE SPACING; SCANNING X RAY INTERFEROMETRY;

SILICON;

EID: 0031119207     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/19.571920     Document Type: Article

References (12)

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