Oxygen-plasma-treated indium-tin-oxide films on nonalkali glass deposited by super density arc plasma ion plating

Japanese Journal of Applied Physics

Volumn 47, Issue 2 PART 1, 2008, Pages 862-866

  Kim, Soo Young ^a   Hong, Kihyon ^a   Son, Jun Ho ^a   Jung, Gwan Ho ^a   Lee, Jong Lam ^a   Choi, Kyu Han ^b,c   Song, Kyu Ho ^c   Ahn, Kyung Chul ^c  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Kyungpook National University   (South Korea)

^c Shin An SNP   (South Korea)

Author keywords

Indium tin oxide; Non alkali glass; O2 plasma treatment; Organic light emitting diode; Super density arc plasma ion plating; Synchrotron radiation photoemission spectroscopy

Indexed keywords

ALKALINITY; CAVITY RESONATORS; CONTACT ANGLE; ELECTRIC PROPERTIES; ELECTROMAGNETIC WAVES; ELECTRONIC EQUIPMENT; EMISSION SPECTROSCOPY; GLASS; HYDROPHILICITY; INDIUM; ION IMPLANTATION; IONS; LIGHT EMISSION; LIGHT EMITTING DIODES; LUMINESCENCE OF ORGANIC SOLIDS; ORGANIC LIGHT EMITTING DIODES (OLED); OXYGEN; PHOTOELECTRICITY; PHOTOEMISSION; PHOTOLITHOGRAPHY; PLASMA APPLICATIONS; PLASMA DIODES; PLASMAS; PLATING; PROBABILITY DENSITY FUNCTION; SYNCHROTRON RADIATION; SYNCHROTRONS; TIN; TITANIUM COMPOUNDS; WORK FUNCTION;

INDIUM TIN OXIDE; NON-ALKALI GLASS; O2 PLASMA TREATMENT; ORGANIC LIGHT-EMITTING DIODE; SUPER DENSITY ARC PLASMA ION PLATING; SYNCHROTRON RADIATION PHOTOEMISSION SPECTROSCOPY;

OXIDE FILMS;

EID: 54249097945     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.862     Document Type: Article

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