Deposition of indium tin oxide thin films by cathodic arc ion plating

Thin Solid Films

Volumn 484, Issue 1-2, 2005, Pages 39-45

  Yang, Ming Huei ^a   Wen, Jyh Chung ^a   Chen, Kai Lin ^a   Chen, Shau Yi ^a   Leu, Ming Sheng ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Conductivity; Indium tin oxide; Ion plating; Plasma processing and deposition

Indexed keywords

CATHODES; ELECTRIC CONDUCTIVITY; ELECTRON MOBILITY; INDIUM COMPOUNDS; LIQUID CRYSTAL DISPLAYS; MORPHOLOGY; OXYGEN; PLASMA THEORY; PLATING; SINTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CATHODIC ARC ION PLATING (CAIP); INDIUM TIN OXIDE (ITO); ION PLATING; PLASMA PROCESSING AND DEPOSITION;

DEPOSITION;

EID: 19944411174     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.01.052     Document Type: Article

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