Surface cleaning of indium tin oxide by atmospheric air plasma treatment with the steady-state airflow for organic light emitting diodes

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 4973-4978

  Lee, Eung Suok ^a   Choi, Jai Hyuk ^b   Baik, Hong Koo ^b  

^a Samsung Electro Mechanics   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

Air blowing; Atmospheric air plasma; In line process; ITO cleaning; Vacuum plasma treatment

Indexed keywords

CONTAMINATION; LIGHT EMITTING DIODES; PLASMA APPLICATIONS; SURFACE CLEANING; VACUUM APPLICATIONS;

ATMOSPHERIC AIR PLASMA; STEADY-STATE AIRFLOW; VACUUM PLASMA TREATMENT;

INDIUM COMPOUNDS;

CONTAMINATION; INDIUM COMPOUNDS; LIGHT EMITTING DIODES; PLASMA APPLICATIONS; SURFACE CLEANING; VACUUM APPLICATIONS;

EID: 33846553515     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.202     Document Type: Article

References (20)

1. Li F., Tang H., Shinar J., Resto O., and Weisz S.Z. Appl. Phys. Lett. 70 (1997) 2741
2. Furukawa K., Terasaka Y., Ueda H., and Matsumura M. Synth. Met. 91 (1997) 99
3. Wu C.C., Wu C.I., Sturm J.C., and Kahn A. Appl. Phys. Lett. 70 (1997) 1348
4. Kim J.S., Friend R.H., and Cacialli F. Appl. Phys. Lett. 74 (1999) 3084
5. So S.K., Choi W.K., Cheng C.H., Leung L.M., and Kwong C.F. Appl. Phys., A Mater. Sci. Process. 68 (1999) 447
6. Appleyard S.F.J., and Willis M.R. Opt. Mater. 9 (1998) 120
7. Chan I.-M., Cheng W.-C., and Hong C.F. Appl. Phys. Lett. 80 (2002) 13
8. Kim J.S., Cacialli F., Granstrom M., Friend R.H., Johanson N., Salaneck W.R., Daik R., and Feast W.J. Synth. Met. 101 (1999) 111
9. Massines F., and Gouda G. J. Phys., D, Appl. Phys. 31 (1998) 3411
10. Shenton M.J., and Stevens G.C. J. Phys., D, Appl. Phys. 34 (2001) 2761
11. Raizer Y.P. Gas discharge Physics (1991), Springer, Verlag Berlin 243
12. Akishev Y.S., Deryugin A.A., Kochetov I.V., Napartovich A.P., and Trushkin N.I. J. Phys., D, Appl. Phys. 26 (1993) 1630
13. Owens D.K., and Wendt R.C. J. Appl. Polym. Sci. 13 (1969) 1741
14. Wong C.P., and McBride R. Pre-encapsulation cleaning methods and control for microelectronics packaging. Proceedings of the 44th Electronics and Computer Technology Conference (1994) 121
15. Schrader M.E. Surface Contamination: Its Genesis, Detection and Control vol. 2 (1979), Plenum Press, London 697
16. Sugiyama K., Ishii H., Ouchi Y., and Seki K. J. Appl. Phys. 87 295 (2000)
17. Kim H., Pique A., Horwitz J.S., Mattoussi H., Murata H., Kafafi Z.H., and Chrisey D.B. Appl. Phys. Lett. 74 (1999) 3444
18. Chkoda L., Heske C., Sokolowski M., Umbach E., Steuber F., Staudigel J., and Simmerer J. Synth. Met. 111-112 (2000) 315
19. Purvis K.L., Lu G., Schwartz J., and Bernasek S.L. J. Am. Chem. Soc. 122 (2000) 1808
20. Ishida T., Kobayashi H., and Nakato Y. J. Appl. Phys. 73 (1993) 4344