Oligothiophenes in organic thin film transistors - Morphology, stability and temperature operation

Organic Electronics

Volumn 9, Issue 6, 2008, Pages 1061-1068

  Xia, Qi ^a   Burkhardt, Martin ^a   Halik, Marcus ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Charge carrier mobility; Morphology; Oligothiophenes; Stability

Indexed keywords

CARRIER MOBILITY; CHARGE CARRIERS; CONVERGENCE OF NUMERICAL METHODS; MORPHOLOGY; SUBSTRATES; THIN FILM TRANSISTORS; THIN FILMS;

ELEVATED TEMPERATURE; OLIGOTHIOPHENES; ORGANIC THIN FILM TRANSISTORS; SEMICONDUCTOR DEPOSITION; SUBSTRATE TEMPERATURE; TEMPERATURE OPERATION; THIN FILM MORPHOLOGY; TRANSISTOR PERFORMANCE;

THIN FILM CIRCUITS;

EID: 53749093359     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2008.08.009     Document Type: Article

References (47)

1. Tsumura A., Koezuka H., and Ando T. Appl. Phys. Lett. 49 (1986) 1210
2. Horowitz G., Fichou D., Peng X., Xu Z., and Garnier F. Solid State Commun. 72 (1989) 381
3. Garnier F., Horowitz G., Peng X., and Fichou D. Synth. Methods 45 (1991) 163
4. Katz H.E., Bao Z., and Gilat S.L. Acc. Chem. Res. 34 (2001) 359
5. Barbarella G., Melucci M., and Sotgiu G. Adv. Mater. 17 (2005) 1581
6. Murphy A.R., and Frechet J.M.J. Chem. Rev. 107 (2007) 1066
7. Horowitz G. Organic Electronics: Materials. Manufacturing and Applications (2006), Wiley VCH (Chapter 1)
8. Klauk H. Organic Electronics (2006), Wiley VCH
9. Halik M., Klauk H., Zschieschang U., Schmid G., Ponomarenko S., Kirchmeyer S., and Weber W. Adv. Mater. 15 (2003) 917
10. Ponomarenko S., Kirchmeyer S., Elschner A., Huisman B.-H., Karbach A., and Drechsler D. Adv. Funct. Mater. 13 (2003) 591
11. Klauk H., Halik M., Zschieschang U., Schmid G., Radlik W., and Weber W. J. Appl. Phys. 92 (2002) 5259
12. Pratontep S., Brinkmann M., Nueesch F., and Zuppiroli L. Synth. Methods 146 (2004) 387
13. Dimitrakopoulos C.D., Brown A.R., and Pomp A. J. Appl. Phys. 80 (1996) 2501
14. Torsi L., Lovinger A.J., Crone B., Someya T., Dodabalapur A., Katz H.E., and Gelperin A. J. Phys. Chem. B 106 (2002) 12563
15. Horowitz G., and Hajlaoui M.E. Synth. Methods 122 (2001) 185
16. Locklin J., Roberts M., Mannsfeld S., and Bao Z. J. Macromol. Sci. Polym. Rev. 46 (2006) 79
17. Weitz R.T., Amsharov K., Zschieschang U., Barrena V.E., Goswami D.K., Burghard M., Dosch H., Jansen M., Kern K., and Klauk H. JACS 130 (2008) 4637
18. Goldmann C., Krellner C., Pernstich K.P., Haas S., Gundlach D.J., and Batlogg B. J. Appl. Phys. 99 (2006) 034507/1
19. Podzorov V., Pudalov V.M., and Gershenson M.E. Appl. Phys. Lett. 82 (2003) 1739
20. Anthony J.E. Angew. Chem. Int. Ed. 47 (2008) 452
21. Yang S.Y., Shin K., and Park C.E. Adv. Funct. Mater. 15 (2005) 1806
22. Knipp D., Street R.A., Volkel A., and Ho J. J. Appl. Phys. 93 (2003) 347
23. Guo D., Ikeda S., Saiki K., Miyazoe H., and Terashima K. J. Appl. Phys. 99 (2006) 094502/1
24. Locklin J., and Bao Z. Anal. Bioanal. Chem. 384 (2006) 336
25. Ponomarenko S., Kirchmeyer S., Halik M., Klauk H., Zschieschang U., Schmid G., Karbach A., Drechsler D., and Alpatova N.M. Synth. Methods 149 (2005) 231
26. Dodabalapur A., Torsi L., and Katz H.E. Science 268 (1995) 270
27. Ruiz R., Choudhary D., Nickel B., Toccoli T., Chang K.-C., Mayer A.C., Clancy P., Blakely J.M., Headrick R.L., Iannotta S., and Malliaras G.G. Chem. Mater. 16 (2004) 4497
28. Dinelli F., Murgia M., Levy P., Cavallini M., Biscarini F., and de Leeuw D.M. Phys. Rev. Lett. 92 (2004) 116802-1
29. Yang S.Y., Shin K., and Park C.E. Adv. Funct. Mater. 15 (2005) 1806
30. Mottaghi M., and Horowitz G. Org. Electron. 7 (2006) 528
31. Qiu Y., Hu Y., Dong G., Wang L., Xie J., and Ma Y. Appl. Phys. Lett. 83 (2003) 1644
32. Yan X., Wang H., and Yan D. Thin Solid Films 515 (2006) 2655
33. Northrup J.E., and Chabinyc M.L. Phys. Rev. B 68 (2003) 041202/1
34. Klauk H., Zschieschang U., Weitz R.T., Meng H., Sun F., Nunes G., Keys D.E., Fincher C.R., and Xiang Z. Adv. Mater. 19 (2007) 3882
35. Salleo A., Endicott F., and Street R.A. Appl. Phys. Lett. 86 (2005) 263505/1
36. Ye R., Baba M., Suzuki K., Ohishi Y., and Mori K. Thin Solid Films 464 (2004) 437
37. Darlinski G., Bottger U., Waser R., Klauk H., Halik M., Zschieschang U., Schmid G., and Dehm C. J. Appl. Phys. 97 (2005) 093708/1
38. Zhu Z.-T., Mason J.T., Dieckmann R., and Malliaras G.G. Appl. Phys. Lett. 81 (2002) 4643
39. Li D., Borkent E.-J., Nortrup R., Moon H., Katz H., and Bao Z. Appl. Phys. Lett. 86 (2005) 042105/1
40. Klauk H., Zschieschang U., Pflaum J., and Halik M. Nature 445 (2007) 745
41. Takamatsu Y., Sekitani T., and Someya T. Appl. Phys. Lett. 90 (2007) 133516/1
42. Horowitz G., Hajlaoui M., Mohsen E., and Hajlaoui R. J. Appl. Phys. 87 (2000) 4456
43. Hamadani B.H., and Natelson D. Proc. IEEE 93 (2005) 1306
44. Minari T., Nemoto T., and Isoda S. J. Appl. Phys. 99 (2006) 034506/1
45. Jung S., Ji T., and Varadan V.K. Appl. Phys. Lett. 90 (2007) 062105/1
46. Hulea I.N., Fratini S., Xie H., Mulder C.L., Iossad N.N., Rastelli G., Ciuchi S., and Morpurgo A.F. Nat. Mater. 5 (2006) 982
47. Ng T.N., Silveira W.R., and Marohn J.A. Phys. Rev. Lett. 98 (2007) 066101/1