Structural, optical and electrical characteristics of ITO thin films deposited by sputtering on different polyester substrates

Materials Chemistry and Physics

Volumn 112, Issue 2, 2008, Pages 641-644

  Guillen C ^a   Herrero, J ^a  

^a CIEMAT   (Spain)

Author keywords

Crystal structure; Electrical properties; Optical properties; Sputtering; Thin films

Indexed keywords

CARRIER CONCENTRATION; CONCENTRATION (PROCESS); CRYSTALLITE SIZE; GALLIUM ALLOYS; GLASS; NANOCRYSTALLINE ALLOYS; OPTICAL GLASS; OXIDE FILMS; POSITRON EMISSION TOMOGRAPHY; POWER AMPLIFIERS; THICK FILMS; THIN FILMS; TIN; TITANIUM COMPOUNDS;

CRYSTAL STRUCTURE; ELECTRICAL PROPERTIES; OPTICAL PROPERTIES; SPUTTERING;

SUBSTRATES;

EID: 53349127447     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.06.027     Document Type: Article

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