Excimer laser induced crystallization of amorphous silicon on flexible polymer substrates

Thin Solid Films

Volumn 487, Issue 1-2, 2005, Pages 58-62

  Imparato, Antonio ^a   Minarini, Carla ^a   Rubino, Alfredo ^a   Tassini, Paolo ^a   Villani, Fulvia ^a   Della Sala, Dario ^a   Amendola, Eugenio ^b   Kunst, Marinus ^c   Neitzert, Heinz Christoph ^d   Bellone, Salvatore ^d  

^a ENEA CR Portici   (Italy)

^b CNR   (Italy)

^c HAHN MEITNER INSTITUT   (Germany)

^d UNIVERSITY OF SALERNO   (Italy)

Author keywords

Hydrogenated amorphous silicon; Laser irradiation; Polymers; X ray diffraction

Indexed keywords

CRYSTALLIZATION; DEHYDROGENATION; EXCIMER LASERS; GLASS TRANSITION; LASER BEAM EFFECTS; LASER PULSES; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENE TEREPHTHALATES; POLYMERS; X RAY DIFFRACTION;

HYDROGENATED AMORPHOUS SILICON; OPTIMUM DEPOSITION; RADIATION ENERGY; STRUCTURAL CHARACTERIZATIONS;

AMORPHOUS SILICON;

EID: 22944447459     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.01.035     Document Type: Conference Paper

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