Inverse image problem of designing phase shifting masks in optical lithography

Proceedings - International Conference on Image Processing, ICIP

Volumn , Issue , 2008, Pages 1832-1835

  Chan, Stanley H ^a   Lam, Edmund Y ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Inverse problems; Optical lithography; Optical proximity correction; Resolution enhancement techniques

Indexed keywords

CRITICAL CHALLENGES; DYNAMIC PROGRAMS; HIGH CONTRAST; IMAGE PROBLEM; INTEGRATED CIRCUIT FABRICATION; INVERSE LITHOGRAPHY; LOW DOSE; MASK DESIGN; MINIMUM FEATURE SIZES; NON-LINEAR OPTIMIZATION; OPTICAL LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION; PHASE-SHIFTING MASK; RESOLUTION ENHANCEMENT TECHNIQUE; RESOLUTION ENHANCEMENT TECHNIQUES;

DIFFERENTIAL EQUATIONS; IMAGE PROCESSING; IMAGING SYSTEMS; INTEGRATED CIRCUITS; OPTICAL DATA PROCESSING; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY;

INVERSE PROBLEMS;

EID: 69949131722     PISSN: 15224880     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICIP.2008.4712134     Document Type: Conference Paper

References (7)

1. Y. Liu and A. Zakhor, "Binary and phase shifting mask design for optical lithography," IEEE Transactions on Semiconductor Manufacturing, vol. 5, pp. 138-151, 1992.
2. Amyn Poonawala and Peyman Milanfar, "OPC and PSM design using lithography: A non-linear optimization approach," in Optical Microlithography XIX, March 2006, vol. 6154 of Proceedings of SPIE.
3. Stanley H. Chan, Alfred K. Wong, and Edmund Y. Lam, "Inverse synthesis of phase-shifting mask for optical lithography," OSA Topic Meeting on Signal Recovery and Synthesis, June 2007.
4. Stanley H. Chan, Alfred K. Wong, and Edmund Y. Lam, "Fast and robust inverse synthesis of phase shifting masks: Algorithm and initialization," Submitted to Journal of Optical Society of America A, September 2007.
5. Philip E. Gill, Walter Murray, and Margaret H. Wright, Practical optimization, Academic Press, London, 1981.
6. A. Moniwa and T. Terasawa, "Heuristic method for phase-conflict minimization in automatic phase-shift mask design," Japanese Journal of Applied Physics, vol. 34, no. I-12B, pp. 6584-6589, 1995.
7. W.T. Pong and Alfred K. Wong, "Quantification of image quality," 2002, vol. 4691 of Proceedings of SPIE, pp. 169-178.