ELIAD: Efficient lithography aware detailed router with compact post-OPC printability prediction

Proceedings - Design Automation Conference

Volumn , Issue , 2008, Pages 504-509

  Cho, Minsik ^a   Yuan, Kun ^a   Ban, Yongchan ^a   Pan, David Z ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Lithography; Manufacturability; OPC; Routing; VLSI

Indexed keywords

LITHOGRAPHY; MANUFACTURABILITY; OPC; ROUTING; VLSI;

ARSENIC COMPOUNDS; COMPUTER AIDED DESIGN; COMPUTER NETWORKS; DIGITAL INTEGRATED CIRCUITS; INDUSTRIAL ENGINEERING; POWDERS; SILICON;

PHOTOLITHOGRAPHY;

EID: 51549106356     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/DAC.2008.4555869     Document Type: Conference Paper

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