Pattern sensitive placement for manufacturability

Proceedings of the International Symposium on Physical Design

Volumn , Issue , 2007, Pages 27-34

  Hu, Shiyan ^a   Hu, Jiang ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

Author keywords

Manufacturability; Physical design; Placement

Indexed keywords

ALGORITHMS; OPTICAL RESOLVING POWER; QUALITY ASSURANCE; REFRACTION; VLSI CIRCUITS; WAVELENGTH;

LITHOGRAPHY WAVELENGTH; MANUFACTURABILITY; PHYSICAL DESIGN; PLACEMENT;

LITHOGRAPHY;

EID: 34748818857     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1231996.1232004     Document Type: Conference Paper

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