Effective crosstalk isolation with post-CMOS selectively grown porous silicon technique for radio frequency system-on-chip (SOC) applications

IEEE Electron Device Letters

Volumn 29, Issue 9, 2008, Pages 994-997

  Li, Chen ^a   Liao, Huailin ^a   Wang, Chuan ^a   Huang, Ru ^a   Wang, Yangyuan ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

Crosstalk isolation; Post CMOS; Radio frequency (RF); Selectively grown porous silicon (SGPS); Substrate selective transformation engineering; System on chip (SOC)

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS; COMPUTER NETWORKS; CROSSTALK; ELECTROMAGNETIC WAVES; INTEGRATED CIRCUITS; PROGRAMMABLE LOGIC CONTROLLERS; RADIO; RADIO WAVES; SEMICONDUCTING SILICON COMPOUNDS; SEPARATION; SILICON; SPACE OPTICS; SUBSTRATES;

CROSSTALK ISOLATION; POST-CMOS; RADIO FREQUENCY (RF); SELECTIVELY GROWN POROUS SILICON (SGPS); SUBSTRATE SELECTIVE-TRANSFORMATION ENGINEERING; SYSTEM-ON-CHIP (SOC);

POROUS SILICON;

EID: 50649102886     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2008.2001479     Document Type: Article

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