Large-area low-damage plasma sources driven by multiple low-inductance-antenna modules for next-generation flat-panel display processes

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5225-5229

  Setsuhara, Yuichi ^a   Takenaka, Kosuke ^a   Ebe, Akinori ^b  

^a OSAKA UNIVERSITY   (Japan)

^b EMD Corporation   (Japan)

Author keywords

Inductively coupled plasma; Large area plasma; Meter scale processing; Plasma profile control

Indexed keywords

ANTENNA ACCESSORIES; ANTENNAS; ELECTROMAGNETISM; INDUCTANCE; PLASMAS;

ANTENNA MODULES; CONTROL TECHNOLOGIES; COUPLED PLASMAS; HIGH-DENSITY; INDUCTIVELY-COUPLED PLASMA; LARGE-AREA PLASMA; LARGE-AREA PROCESSING; LOW-INDUCTANCE ANTENNA; METER-SCALE PROCESSING; PLASMA-PROFILE CONTROL;

FLAT PANEL DISPLAYS;

EID: 50349099801     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.001     Document Type: Article

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