Etching characteristic of ZnO thin films in an inductively coupled plasma

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5705-5708

  Woo, J C ^a   Kim, G H ^a   Kim, J G ^a   Kim, C I ^a  

^a Chung Ang University   (South Korea)

Author keywords

Etch; ICP; ZnO

Indexed keywords

ETCHING; INDUCTIVELY COUPLED PLASMA; PHOTORESISTS; SILICON COMPOUNDS; THICK FILMS; ZINC ALLOYS; ZINC OXIDE;

COUPLED PLASMAS; ETCH; ETCH SELECTIVITIES; ETCHING CHARACTERISTICS; ICP; ZNO; ZNO THIN FILMS;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 50349084354     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.077     Document Type: Article

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