Silane nanopatterns via gas-phase soft lithography

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Volumn 4, Issue 8, 2008, Pages 1076-1079

  De La Rica, Roberto ^a,c   Baldi, Antonio ^a   Mendoza, Ernest ^b   San Paulo, Álvaro ^a   Llobera, Andreu ^a   Fernández Sánchez, César ^a  

^a CSIC   (Spain)

^b UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^c CITY UNIVERSITY OF NEW YORK   (United States)

Author keywords

Gas phase reactions; Nanolithography; Nanopatterning; Organoalkoxysilanes; Soft lithography

Indexed keywords

CHEMICAL REACTIONS; LITHOGRAPHY; MICROCHANNELS; MOLECULES; NANOLITHOGRAPHY; PHASE INTERFACES; SUBSTRATES;

GAS PHASE MOLECULES; GAS-PHASE REACTIONS; NANOPATTERNING; ORGANOALKOXYSILANES; POLYDIMETHYLSILOXANE PDMS; SILICON SUBSTRATES; SOFT LITHOGRAPHY; VOLATILE MOLECULES;

GASES;

(3 MERCAPTOPROPYL)TRIMETHOXYSILANE; (3-MERCAPTOPROPYL)TRIMETHOXYSILANE; 3 AMINOPROPYLTRIMETHOXYSILANE; 3-AMINOPROPYLTRIMETHOXYSILANE; BAYSILON; DIMETICONE; PROPYLAMINE; SILANE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; DIFFUSION; GAS; NANOTECHNOLOGY; SURFACE PROPERTY;

DIFFUSION; DIMETHYLPOLYSILOXANES; GASES; MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; PROPYLAMINES; SILANES; SURFACE PROPERTIES;

EID: 49749121903     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200701038     Document Type: Article

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