Nanometer-scale patterning of self-assembled monolayer films on native silicon oxide

Applied Physics Letters

Volumn 73, Issue 14, 1998, Pages 1976-1978

  Inoue, A ^a   Ishida, T ^a   Choi, N ^a   Mizutani, W ^b   Tokumoto, H ^b  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001472645     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122340     Document Type: Article

References (18)

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