Wet chemical etching method for BST thin films annealed at high temperature

Applied Surface Science

Volumn 254, Issue 21, 2008, Pages 6697-6700

  Zhang, R T ^a   Yang, C R ^a   Yu, A ^a   Wang, B ^a   Tang, H J ^a   Chen, H W ^a   Zhang, J H ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Annealing temperature; RF magnetron sputtering; Wet chemical etching

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; CHLORINE COMPOUNDS; HYDROFLUORIC ACID; MAGNETRON SPUTTERING; NITRIC ACID; STRONTIUM COMPOUNDS; THIN FILMS; TITANIUM COMPOUNDS;

ANNEALING TEMPERATURES; BA0.5SR0.5TIO3; BST FILM; BST THIN FILMS; EFFICIENT CATALYSTS; HIGH TEMPERATURE; RF-MAGNETRON SPUTTERING; STRONG ACIDS;

WET ETCHING;

EID: 49549108895     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.233     Document Type: Review

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