Plasma etching of (Ba,Sr)TiO3 thin films using inductively coupled Cl2/Ar and BCl3/Cl2/Ar plasma

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 86-90

  Kim, Gwan Ha ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

(Ba,Sr)TiO3; Etching; ICP; Langmuir probe; OES

Indexed keywords

ARGON; CHLORINE; COMPOSITION; INDUCTIVELY COUPLED PLASMA; LEAKAGE CURRENTS; PERMITTIVITY; PLASMA ETCHING; TITANIUM OXIDES;

ETCHING PARAMETERS; ICP; LANGMUIR PROBE; OPTICAL EMISSION SPECTROSCOPY (OES);

THIN FILMS;

EID: 13444251192     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.028     Document Type: Conference Paper

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