Effect of oxygen gas and annealing treatment for magnetically enhanced reactive ion etched (Ba0.65, Sr0.35) Ti O3 thin films

Journal of Applied Physics

Volumn 101, Issue 1, 2007, Pages

  Zhang, Baishun ^b   Quan, Zuci ^b   Zhang, Tianjin ^b   Guo, Tao ^b   Mo, Shaobo ^a  

^a WUHAN UNIVERSITY   (China)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; OXYGEN; REACTIVE ION ETCHING; SOL-GELS; TITANIUM COMPOUNDS; TRANSITION METALS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING TREATMENT; ETCHING EFFECTS; MAGNETICALLY ENHANCED REACTIVE ION ETCHING; REACTION PRODUCTS;

THIN FILMS;

EID: 33846308872     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2402100     Document Type: Article

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