Ion beam etching of PZT thin films: Influence of grain size on the damages induced

Journal of the European Ceramic Society

Volumn 25, Issue 12 SPEC. ISS., 2005, Pages 2269-2272

  Soyer, Caroline ^a   Cattan, E ^a   Remiens D ^a  

^a INSTITUT D ELECTRONIQUE   (France)

Author keywords

Electrical properties; Etching damage; Films; Grain size; PZT

Indexed keywords

ETCHING; FERROELECTRICITY; GRAIN SIZE AND SHAPE; ION BEAMS; MICROSTRUCTURE; SPUTTERING; SURFACE ROUGHNESS;

AR GAS; ETCHING PARAMETERS; ION BEAM ETCHING;

FERROELECTRIC THIN FILMS;

ETCHING;

EID: 20444465674     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2005.03.043     Document Type: Article

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