Selective etching of (Ba,Sr)TiO3 thin films over silicon in an inductively coupled plasma

Microelectronic Engineering

Volumn 84, Issue 1, 2007, Pages 187-191

  Kim, Gwan Ha ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

(Ba,Sr)TiO3; Langmuir probe; OES; QMS; Selective etching

Indexed keywords

BARIUM COMPOUNDS; EMISSION SPECTROSCOPY; ETCHING; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; TITANIUM OXIDES;

ETCH RATE; LANGMUIR PROBE (LP); OPTICAL EMISSION SPECTROSCOPY (OES); QUADRUPOLE MASS SPECTROMETRY (QMS);

THIN FILMS;

EID: 33751394372     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.10.081     Document Type: Article

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