Wet and dry etching of La0.67(Sr,Ca)0.33 MnO3 films on Si

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 587-590

  Kim, Joo Hyung ^a   Grishin, Alexander M ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

Ar ion beam; BHF; Colossal magnetoresistors; Etching rate; KOH; Si

Indexed keywords

CERIUM COMPOUNDS; COLOSSAL MAGNETORESISTANCE; EPITAXIAL GROWTH; ETCHING; MANGANESE COMPOUNDS; POTASSIUM COMPOUNDS; SILICON; TITANIUM;

AR ION BEAM; BHF; ETCHING RATE; KOH;

THIN FILMS;

EID: 33748765526     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.183     Document Type: Article

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