Atomic force microscopic imaging and wet etching of Bi2Ti 2O7 thin films

Materials Science and Engineering: B

Volumn 102, Issue 1-3, 2003, Pages 335-338

  Wang, Z ^a   Yang, C H ^a   Sun, D L ^a   Hu, J F ^a   Wang, H ^a   Chen, H C ^a   Fang, C S ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

Atomic force microscopy; Chemical wet etching; Sol gel method

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; MORPHOLOGY; SEMICONDUCTING BISMUTH COMPOUNDS; SOL-GELS;

WET ETCHING;

THIN FILMS;

EID: 0042512462     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00614-1     Document Type: Conference Paper

References (12)

1. Wu S.Y. IEEE Trans. Electron Devices. 21:1974;499.
2. Wu S.Y., Takei W.J., Francombe M.H. Ferroelectrics. 10:1976;209.
3. Knop O., Brisse F., Castelliz L. Can. J. Chem. 47:1969;971-990.
4. Yordanov S.P., Ivanov I., Carapanov Ch.P. J. Phys. D. 31:1998;800.
5. Wang Z., Huang J., Wang S.W., Xu X.H., Hou Y., Wang M., Wang H., Wang C.L., Hu J.F., Wang Y.G. Ferroelectrics. 252:2001;232-240.
6. Shimada S., Kodaira K., Matsushita T. J. Cryst. Growth. 41:1977;317.
7. Xiao Z.B., Wu X.M., Wang S.W., Wang H., Wang Z., Sang S.X., Wang M. J. Funct. Mater. Devices. 7:(2):2001;171-174.
8. S. Wolf, R.N. Tauber, Silicon Processing for the VLSI Era, 2nd Edition, Process Technology, Vol. 1, Lattice Press, 2000.
9. Chang C.Y., Sze S.M. ULSI Technology. 1996;McGraw-Hill, New York.
10. Wang Z., Sun D.L., Hu J.F., Cui D.L., Xu X.H., Wang D., Zhang Y., Wang M., Wang H., Chen H.C., Fang C.S. J. Cryst. Growth. 235:(1-4):2002;411-414.
11. Fu L.W., Wang H., Shang S.X., Wang X.L., Xu P.M. J. Cryst. Growth. 139:1994;319.
12. Wu X.M., Wang S.W., Wang H., Wang Z., Shang S.X., Wang M. Thin Solid Films. 370:2000;30.