Morphology of cobalt layers on native SiO2 surfaces at elevated temperatures: Formation of Co islands

Surface Science

Volumn 602, Issue 15, 2008, Pages 2693-2698

  Čechal, Jan ^a   Luksch, Jaroslav ^a   Koňáková, Kateřina ^a   Urbánek, Michal ^a   Brandejsová, Eva ^a   Šikola, Tomáš ^a  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

AFM; Cobalt, Co; Islands; MFM; Photoelectron spectroscopy; Silicon dioxide, SiO2; SPM; XPS

Indexed keywords

ANNEALING; COBALT; TRANSITION METALS;

AFM; ANNEALING TEMPERATURE; COBALT LAYERS; COBALT, CO; ISLANDS; MFM; PHOTOELECTRON SPECTROSCOPY; SILICON DIOXIDE, SIO2; SPM; XPS;

SILICON COMPOUNDS;

EID: 49149129433     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.06.023     Document Type: Article

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