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Volumn 68, Issue 24, 1996, Pages 3461-3463

Oxide mediated epitaxy of CoSi2 on silicon

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001602280     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115793     Document Type: Article
Times cited : (193)

References (14)
  • 1
    • 0027703140 scopus 로고    scopus 로고
    • K. Maex, Mater. Sci. Eng. Rep. R11, 53 (1993).
    • K. Maex, Mater. Sci. Eng. Rep. R11, 53 (1993).
  • 2
    • 0026908987 scopus 로고    scopus 로고
    • R. T. Tung, Mater. Chem. Phys. 32, 107 (1993).
    • R. T. Tung, Mater. Chem. Phys. 32, 107 (1993).
  • 9
    • 21544444308 scopus 로고    scopus 로고
    • R. T. Tung, in Handbook on Semiconductors, Vol. 3b: Materials, Properties, and Preparations, edited by S. Mahajan (Elsevier, New York, 1993).
    • R. T. Tung, in Handbook on Semiconductors, Vol. 3b: Materials, Properties, and Preparations, edited by S. Mahajan (Elsevier, New York, 1993).
  • 11
    • 21544473054 scopus 로고    scopus 로고
    • H. Sumi, T. Nishihara, Y. Sugano, H. Masuya, and M. Takasu, IEDM 249 (1990).
    • H. Sumi, T. Nishihara, Y. Sugano, H. Masuya, and M. Takasu, IEDM 249 (1990).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.