Interaction between Co and SiO 2

Applied Surface Science

Volumn 136, Issue 1-2, 1998, Pages 87-94

  Kondoh, E ^a,b   Donaton, R A ^a   Jin, S ^a   Bender, H ^a   Vandervorst, W ^a   Maex, K ^a,c  

^a IMEC   (Belgium)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Cobalt; Rapid thermal annealing (RTA); SiO 2 (silicon dioxide)

Indexed keywords

AGGLOMERATION; COBALT; DEPOSITION; EROSION; PITTING; RAPID THERMAL ANNEALING; REACTION KINETICS; SILICA; THIN FILMS; WATER;

ORTHOSILICATE;

METALLIC FILMS;

EID: 0032181874     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00312-2     Document Type: Article

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