Heterogeneous oxidation of Si(1 1 1) 7 × 7 monitored with Kelvin probe force microscopy

Surface Science

Volumn 601, Issue 19, 2007, Pages 4598-4602

  Sturm, J M ^a   Wormeester, H ^a   Poelsema, Bene ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Atomic force microscopy; Kelvin probe force microscopy; Oxygen; Scanning probe techniques; Silicon; Work function measurements

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFACES (MATERIALS); MOLECULAR OXYGEN; OXIDATION; OXIDE FILMS; SURFACE TOPOGRAPHY; WORK FUNCTION;

HETEROGENEOUS OXIDATION PROCESS; KELVIN PROBE FORCE MICROSCOPY; SCANNING PROBE TECHNIQUES; WORK FUNCTION MEASUREMENTS;

SILICON COMPOUNDS;

EID: 34548847434     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.07.016     Document Type: Article

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