The effect of fine channel & collisional mixing on mist CVD method

Zairyo/Journal of the Society of Materials Science, Japan

Volumn 57, Issue 5, 2008, Pages 481-487

  Kawaharamura, Toshiyuki ^a   Nishinaka, Hiroyuki ^a   Fujita, Shizuo ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Computational fluid dynamics; Fine channel; Homogeneous thin film; Micro channel; Mist CVD; Mist deposition; Spray pyrolysis; The uniform flow of mists; Transparent conductive thin films; Ultrasonic formation of mist; Zinc acetate; ZnO

Indexed keywords

AEROSOL PARTICLES; ATMOSPHERIC CONDITIONS; CARRIER GASES; CHEMICAL VAPORS; COMPUTATIONAL FLUID DYNAMICS; CONSTITUENT ELEMENTS; CONTINUOUS PROCESSING; COST-EFFECTIVE TECHNOLOGY; CVD METHOD; ENVIRONMENTAL-FRIENDLY; FINE-CHANNEL; GLASS SUBSTRATES; HOMOGENEOUS THIN FILM; LIGHT LOADS; LIQUID SOLUTIONS; MICRO-CHANNEL; MIST CVD; MIST DEPOSITION; SOURCE MATERIALS; THE UNIFORM FLOW OF MISTS; THIN OXIDE FILMS; TRANSPARENT CONDUCTIVE THIN FILMS; ULTRASONIC FORMATION OF MIST; UNIFORM FLOWS; VACUUM SYSTEMS; ZINC ACETATE; ZNO; ZNO THIN FILMS;

CHEMICAL REACTIONS; CIVIL AVIATION; COST EFFECTIVENESS; FUZZY RULES; FUZZY SYSTEMS; KETONES; LAW ENFORCEMENT; MIXING; OPTICAL DESIGN; OXIDE FILMS; RATE CONSTANTS; SOLUTIONS; SPRAY PYROLYSIS; SUBSTRATES; TECHNOLOGY; THICK FILMS; THIN FILMS; ZINC OXIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 48849112558     PISSN: 05145163     EISSN: None     Source Type: Journal    
DOI: 10.2472/jsms.57.481     Document Type: Article

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