Linear-source ultrasonic spray chemical vapor deposition method for fabrication of ZnMgO films and ultraviolet photodetectors

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 29-32, 2006, Pages

  Kamada, Yudai ^a   Kawaharamura, Toshiyuki ^a   Nishinaka, Hiroyuki ^a   Fujita, Shizuo ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Transparent thin film; Ultrasonicspray; Ultraviolet photodetector; Wide band gap semiconductor; ZnMgO

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ENERGY GAP; LIGHT TRANSMISSION; ULTRASONICS; ULTRAVIOLET DETECTORS; ZINC COMPOUNDS;

ULTRASONIC SPRAY; ULTRAVIOLET PHOTODETECTORS; WIDEBAND GAP SEMICONDUCTORS;

THIN FILMS;

EID: 33846562378     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L857     Document Type: Article

References (20)

1. J. Nishii, A. Ohtomo, K. Ohtani, H. Ohno and M. Kawasaki: Jpn. J. Appl. Phys. 44 (2005) L.1193.
2. A. Tsukazaki, M. Kubota, A. Ohtomo, T. Onuma, K. Ohtani, H. Ohno, S. F. Chichibu and M. Kawasaki: Jpn. J. Appl. Phys. 44 (2005) L643.
3. Y. Ohya, T. Kume and T. Ban: Jpn. J. Appl. Phys. 44 (2005) 1919.
4. K. Yasui, N. V. Phuong, Y. Kuroki, M. Takata and T. Akahane: Jpn. J. Appl. Phys. 44 (2005) 684.
5. T. Minami, T. Miyata, Y. Ohtani and Y. Mochizuki: Jpn. J. Appl. Phys. 45 (2006) L409.
6. Q. A. Xu, J. W. Zhang, X. R. Ju, X. D. Yang and X. Hou: J. Cryst. Growth 289 (2006) 44.
7. K. Koike, K. Hama, I. Nakashima, G. Takada, K. Ogata, S. Sasa, M. Inoue and M. Yano: J. Cryst. Growth 278 (2005) 288.
8. A. Ohtomo, S. Takagi, K. Tamura, T. Makino, Y. Segawa, H. Koinuma and M. Kawasaki: Jpn. J. Appl. Phys. 45 (2006) L694.
9. A. Nakamura, K. Yamamoto, J. Ishihara, T. Aoki and J. Temmyo: Jpn. J. Appl. Phys. 44 (2005) 7267.
10. T. Takagi, H. Tanaka, Sz. Fujita and Sg. Fujita: Jpn. J. Appl. Phys. 42 (2003) L401.
11. S. Major, A. Banerjee and K. L. Chopra: Thin Solid Films 108 (1983) 333.
12. A. F. Aktaruzzaman, G. L. Sharma and L. K. Malhotra: Thin Solid Films 198 (1991) 67.
13. K. T. Ramakrishna Reddya, H. Gopalaswamya, P. J. Reddya and R. W. Miles: J. Cryst. Growth 210 (2000) 516.
14. B. J. Lokhande, P. S. Patil and M. D. Uplane: Physica B 302-303 (2001) 59.
15. M. D. L. Olvera, A. Maldonado, R. Asomoza, O. Solorza and D. R. Acosta: Thin Solid Films 394 (2001) 242.
16. Y. Lee, H. Kim and Y. Roh: Jpn. J. Appl. Phys. 40 (2001) 2423.
17. G. Blandenet, M. Court and Y. Lagarde: Thin Solid Films 77 (1981) 81.
18. T. Kawaharamura, H. Nishinaka, K. Kametani, Y. Masuda, M. Tanigaki and S. Fujita: J. Soc. Mater. Sci. Jpn. 55 (2006) 153 [in Japanese].
19. X. Zhang, X. M. Li, T. L. Chen, J. M. Bian and C. Y. Zhang: Thin Solid Films 492 (2005) 248.
20. W. I. Park, G. Yi and M. Jang: Appl. Phys. Lett. 79 (2001) 3022.