Preparation of transparent conducting In4Sn3O12 thin films by DC magnetron sputtering

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 13-18

  Minami, Tadatsugu ^a   Takeda, Yoshihiro ^a   Takata, Shinzo ^a   Kakumu, Toshikazu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Magnetron sputtering; Metal oxides; Transparent conducting oxide; Transparent electrode

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; HALL EFFECT; MAGNETRON SPUTTERING; SUBSTRATES; THIN FILMS;

TRANSPARENT CONDUCTING OXIDES;

CONDUCTIVE FILMS;

EID: 0031245676     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00530-0     Document Type: Article

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