Surface morphology and resistivity of aluminum oxide films prepared by plasma CVD combined with ion beam irradiation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 125-128

  Nakai, H ^a   Shinohara, J ^a   Sassa, T ^a   Ikegami, Y ^a  

^a IHI CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ION BEAMS; ION BOMBARDMENT; PLASMA SPRAYING; SURFACE PROPERTIES; VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

ALUMINA;

EID: 0031546156     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00694-5     Document Type: Article

References (3)

1. Y. Ikegami, J. Shinohara and S. Nagano, IHI Eng. Rev. 23 (1990) 16.
2. F. Ida, J. Shinohara, T. Kunikyo and S.C.P. Cook, Proc. 18th AIAA Aerospace Ground Testing Conf. (1994) p. 2537.
3. H. Nakai, H. Kuwahara, J. Shinohara, T. Kawaratani, T. Sassa amd Y. Ikegami, Nucl. Instr. and Meth. B 112 (1996) 280.