An experimental and theoretical investigation of a magnetically confined dc plasma discharge

Journal of Applied Physics

Volumn 104, Issue 1, 2008, Pages

  Rondanini, Maurizio ^a   Cavallotti, Carlo ^a   Ricci, Daria ^b   Chrastina, Daniel ^a   Isella, Giovanni ^a   Moiseev, Tamara ^a   Von Känel, Hans ^a  

^a POLITECNICO DI MILANO   (Italy)

^b UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE (FLUID MECHANICS); FLUID MECHANICS; MAGNETIC FIELDS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

ARC PLASMAS; AXIAL MAGNETIC FIELD (AMF); CYLINDRICAL CHAMBERS; DC PLASMA; HIGH-ELECTRON-DENSITY; IONS IMPINGING; PLASMA EXPANSION; PLASMA REACTORS;

ELECTRIC DISCHARGES;

EID: 47749083119     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2948927     Document Type: Article

References (48)

1. E. J. Doyle, W. A. Houlberg, Y. Kamada, V. Mukhovatov, T. H. Osborne, A. Polevoi, G. Bateman, J. W. Connor, J. G. Cordey, T. Fujita, X. Garbet, T. S. Hahm, L. D. Horton, A. E. Hubbard, F. Imbeaux, F. Jenko, J. E. Kinsey, Y. Kishimoto, J. Li, T. C. Luce, Y. Martin, M. Ossipenko, V. Parail, A. Peeters, T. L. Rhodes, J. E. Rice, C. M. Roach, V. Rozhansky, F. Ryter, G. Saibene, R. Sartori, A. C. C. Sips, J. A. Snipes, M. Sugihara, E. J. Synakowski, H. Takenaga, T. Takizuka, K. Thomsen, M. R. Wade, and H. R. Wilson, Nucl. Fusion 0029-5515 10.1088/0029-5515/47/6/S02 47, S18 (2007).
2. D. W. Hess and D. B. Graves, in Chemical Vapor Deposition, edited by, M. L. Hitchman, and, K. F. Jensen, (Academic, San Diego, 1993).
3. T. J. Sommerer and M. J. Kushner, J. Appl. Phys. 0021-8979 10.1063/1.351196 71, 1654 (1992).
4. J. P. Boeuf, J. Appl. Phys. 0021-8979 10.1063/1.339961 63, 1342 (1988).
5. J. D. Bukowski, D. B. Graves, and P. Vitello, J. Appl. Phys. 0021-8979 10.1063/1.363169 80, 2614 (1996).
6. A. Salabas, G. Gousset, and L. L. Alves, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/11/4/312 11, 448 (2002).
7. M. J. Kushner, J. Appl. Phys. 0021-8979 10.1063/1.1587887 94, 1436 (2003).
8. P. L. G. Ventzek, T. J. Sommerer, R. J. Hoekstra, and M. J. Kushner, Appl. Phys. Lett. 0003-6951 10.1063/1.109963 63, 605 (1993).
9. F. Sigeneger and R. Winkler, Eur. J. Appl. Physiol. 19, 211 (2002). 0340-3793
10. N. Sternberg, V. Godyak, and D. Hoffman, Phys. Plasmas 1070-664X 10.1063/1.2214537 13, 063511 (2006).
11. V. Ivanov, O. Proshina, T. Rakhimova, A. Rakhimov, D. Herrebout, and A. Bogaerts, J. Appl. Phys. 0021-8979 10.1063/1.1461895 91, 6296 (2002).
12. C. K. Birdsall and A. B. Langdon, Plasma Physics via Computer Simulation (McGraw-Hill, New York, 1985).
13. J. P. Boeuf and E. Marode, J. Phys. D 0022-3727 10.1088/0022-3727/15/11/ 012 15, 2169 (1982).
14. E. Neyts, M. Yan, A. Bogaerts, and R. Gijbels, J. Appl. Phys. 0021-8979 10.1063/1.1563820 93, 5025 (2003).
15. Y. P. Reizer, Gas Discharge Physics (Springer, New York, 1991).
16. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharge (Wiley, New York, 1994).
17. A. V. Vasenkov and B. D. Shizgal, Phys. Rev. E 1063-651X 10.1103/PhysRevE.65.046404 65, 046404 (2002).
18. M. Dalvie, S. Hamaguchi, and R. T. Farouki, Phys. Rev. A 1050-2947 10.1103/PhysRevA.46.1066 46, 1066 (1992).
19. M. P. Hong and G. A. Emmert, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.587322 12, 889 (1994).
20. A. Bogaerts, R. Gijbels, and V. V. Serikov, J. Appl. Phys. 0021-8979 10.1063/1.373545 87, 8334 (2000).
21. A. Bogaerts and R. Gijbels, J. Anal. At. Spectrom. 0267-9477 10.1039/b400483c 19, 1206 (2004).
22. Z. Donko, P. Hartmann, and K. Kutasi, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/15/2/002 15, 178 (2006).
23. A. Simon, Phys. Rev. 0031-899X 10.1103/PhysRev.98.317 98, 317 (1955).
24. G. J. M. Hagelaar, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/16/1/S06 16, S57 (2007).
25. M. Lampe, G. Joyce, W. M. Manheimer, and S. P. Slinker, IEEE Trans. Plasma Sci. 0093-3813 10.1109/27.747877 26, 1592 (1998).
26. S. T. Surzhikov and J. S. Shang, J. Comput. Phys. 0021-9991 10.1016/j.jcp.2004.02.019 199, 437 (2004).
27. A. Fruchtman, G. Makrinich, and J. Ashkenazy, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/1/017 14, 152 (2005).
28. C. Rosenblad, H. R. Deller, A. Dommann, T. Meyer, P. Schroeter, and H. von Känel, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.581422 16, 2785 (1998).
29. H. von Känel, M. Kummer, G. Isella, E. Müller, and T. Hackbarth, Appl. Phys. Lett. 0003-6951 10.1063/1.1470691 80, 2922 (2002).
30. M. Kummer, C. Rosenblad, A. Dommann, T. Hackbarth, G. Höck, M. Zeuner, E. Müller, and H. von Känel, Mater. Sci. Eng., B 0921-5107 10.1016/S0921-5107(01)00801-7 89, 288 (2002).
31. H. M. Mott-Smith and I. Langmuir, Phys. Rev. 0031-899X 10.1103/PhysRev.28.727 28, 727 (1926).
32. F. F. Chen, J. Nucl. Energy, Part C 0368-3281 10.1088/0368-3281/7/1/306 7, 47 (1965).
33. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, J. Appl. Phys. 0021-8979 10.1063/1.352924 73, 3657 (1993).
34. C. Cavallotti, M. Di Stanislao, and S. Carra, Prog. Cryst. Growth Charact. Mater. 0960-8974 10.1016/j.pcrysgrow.2005.05.003 48-49, 123 (2004).
35. V. E. Golant, A. P. Zilinskij, and S. E. Sacharov, Fundamentals of Plasma Physics (Wiley, New York, 1980).
36. J. O. Hirschfelder, C. F. Curtiss, and R. B. Bird, Molecular Theory of Gases and Liquids (Wiley, New York, 1954).
37. T. E. Nitschke and D. B. Graves, J. Appl. Phys. 0021-8979 10.1063/1.358435 76, 5646 (1994).
38. T. E. Nitschke and D. B. Graves, IEEE Trans. Plasma Sci. 0093-3813 10.1109/27.467994 23, 717 (1995).
39. S. Longo, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/9/4/ 303 9, 468 (2000).
40. H. R. Skullerud, Br. J. Appl. Phys. 0508-3443 1, 1567 (1968).
41. G. L. Braglia, Lett. Nuovo Cimento Soc. Ital. Fis. 0375-930X 31, 183 (1981).
42. R. B. Bird, W. E. Stewart, and E. N. Lightfoot, Transport Phenomena (Wiley, New York, 2002).
43. A. L. Ward, J. Appl. Phys. 0021-8979 10.1063/1.1702550 33, 2789 (1962).
44. H. Kumar and S. Roy, Phys. Plasmas 1070-664X 10.1063/1.2044747 12, 093508 (2005).
45. J. P. Boeuf and L. C. Pitchford, Phys. Rev. E 1063-651X 10.1103/PhysRevE.51.1376 51, 1376 (1995).
46. S. Rhee and J. Szekely, J. Electrochem. Soc. 0013-4651 10.1149/1.2108368 133, 2194 (1986).
47. A. Yanguas-Gil, J. Cotrino, and L. L. Alves, J. Phys. D 0022-3727 10.1088/0022-3727/38/10/014 38, 1588 (2005).
48. M. Kurihara, Z. L. Petrovic, and T. Makabe, J. Phys. D 0022-3727 10.1088/0022-3727/33/17/309 33, 2146 (2000).