X-ray photoelectron and Raman studies of microwave Plasma Assisted Chemical Vapour Deposition (PACVD) diamond films

Applied Surface Science

Volumn 254, Issue 20, 2008, Pages 6400-6409

  Humbert, Bernard ^a   Hellala, Nesrine ^b   Ehrhardt, Jean Jacques ^a   Barrat, Silvère ^b   Bauer grosse, Elizabeth ^b  

^a Laboratoire de Chimie Physique et Microbiologie pour l'Environnement   (France)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

Chemical vapour deposition; Coatings; Diamond; Diamond films; Internal stresses; Raman; Raman spectroscopy; Stress measurements; X ray spectroscopy; XPS

Indexed keywords

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; COATINGS; DIAMONDS; ENERGY DISSIPATION; PHOTOELECTRONS; PHOTONS; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SPECTROSCOPIC ANALYSIS; STRESS MEASUREMENT; STRESSES; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROSCOPY;

CHEMICAL VAPOUR DEPOSITION; MECHANICAL EFFECTS; MICROWAVE PLASMA; PLASMA CONDITIONS; POLYCRYSTALLINE DIAMOND FILMS; RAMAN; THIN DIAMOND FILMS; X-RAY PHOTOELECTRONS;

DIAMOND FILMS;

EID: 47549106289     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.04.067     Document Type: Article

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