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Journal of Electron Spectroscopy and Related Phenomena

Volumn 121, Issue 1-3, 2001, Pages 183-201

Analysis of chemical vapour deposited diamond films by X-ray photoelectron spectroscopy

(3) Wilson, J I B a Walton, J S a Beamson, G b

a HERIOT WATT UNIVERSITY (United Kingdom)

b DARESBURY LABORATORY (United Kingdom)

Author keywords

CVD; Diamond; Oxidation; Surfaces; Workfunction; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; ELECTRON EMISSION; ION BOMBARDMENT; NUCLEATION; OXIDATION; SINGLE CRYSTALS; SURFACE TREATMENT;

WORKFUNCTIONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0035545914 PISSN: 03682048 EISSN: None Source Type: Journal
DOI: 10.1016/S0368-2048(01)00334-6 Document Type: Article

Times cited : (144)

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