Comparative study of residual stresses measurement methods on CVD diamond films

Scripta Materialia

Volumn 39, Issue 6, 1998, Pages 807-814

  Kim, J G ^a   Yu, Jin ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; ELASTIC MODULI; FILM GROWTH; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SILICON; STRESS ANALYSIS; TENSILE STRESS; X RAY DIFFRACTION ANALYSIS;

DOUBLE CANTILEVER BEAM; HOT FILAMENT CHEMICAL VAPOR DEPOSITION; RAMAN PEAK SHIFT; STRESS MEASUREMENT;

DIAMOND FILMS;

EID: 0032132380     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(98)00182-1     Document Type: Article

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