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Volumn 8, Issue 4, 2008, Pages 2163-2166
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Nano-holes in silicon wafers using laser-induced surface plasmon polaritons
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Author keywords
Nano holes; Plasmon; Silicon wafers
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Indexed keywords
ALUMINA;
ALUMINUM OXIDE;
ASSOCIATIVE STORAGE;
ELECTROMAGNETIC WAVE POLARIZATION;
GOLD DEPOSITS;
LASER BEAMS;
NEODYMIUM LASERS;
PHONONS;
PHOTONS;
PLASMONS;
RANDOM ACCESS STORAGE;
SURFACE PLASMON RESONANCE;
SURFACE PLASMONS;
THIN FILMS;
YTTRIUM ALUMINUM GARNET;
COHERENT INTERFERENCE;
ELECTRICAL FIELD;
MASSIVELY PARALLELS;
NANOHOLES;
POROUS ALUMINA MEMBRANES;
Q SWITCHED ND:YAG LASER;
SILICON SUBSTRATES;
SURFACE PLASMON POLARITONS;
SILICON WAFERS;
NANOMATERIAL;
SILICON;
ARTICLE;
CHEMISTRY;
CONFORMATION;
CRYSTALLIZATION;
LASER;
MACROMOLECULE;
MATERIALS TESTING;
METHODOLOGY;
NANOTECHNOLOGY;
PARTICLE SIZE;
POROSITY;
SURFACE PLASMON RESONANCE;
SURFACE PROPERTY;
ULTRASTRUCTURE;
CRYSTALLIZATION;
LASERS;
MACROMOLECULAR SUBSTANCES;
MATERIALS TESTING;
MOLECULAR CONFORMATION;
NANOSTRUCTURES;
NANOTECHNOLOGY;
PARTICLE SIZE;
POROSITY;
SILICON;
SURFACE PLASMON RESONANCE;
SURFACE PROPERTIES;
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EID: 47149115536
PISSN: 15334880
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (5)
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References (15)
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