Near-field optical nanopatterning of crystalline silicon

Applied Physics Letters

Volumn 84, Issue 12, 2004, Pages 2025-2027

  Wysocki, G ^a,b   Heitz, J ^a   Bauerle D ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b RICE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER LIGHT; PHOTOPHYSICAL ETCHING;

ARGON; CHLORINE; ETCHING; LASER BEAMS; NANOTECHNOLOGY; NEAR FIELD SCANNING OPTICAL MICROSCOPY; PHOTOCHEMICAL REACTIONS; PHOTOREACTIVITY;

SEMICONDUCTING SILICON;

EID: 1942509405     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1689395     Document Type: Article

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