Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 58, Issue 12, 2003, Pages 2093-2104

  Hellin, D ^a,b   Bearda, T ^a   Zhao, C ^a   Raskin, G ^c   Mertens, P W ^a   De Gendt, S ^a   Heyns, M M ^a   Vinckier, C ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c UMICORE   (Belgium)

Author keywords

Droplet sandwich etch; Ge wafers; Metallic contamination; Preconcentration; Total reflection X Ray fluorescence

Indexed keywords

DETECTORS; ETCHING; IMPURITIES; OPTIMIZATION; SANDWICH STRUCTURES; SPIN COATING; SUBSTRATES; WSI CIRCUITS; X RAY SPECTROSCOPY;

DROPLET SANDWICH ETCH (DSE); WET CHEMICAL ETCHING;

SEMICONDUCTING GERMANIUM;

EID: 0348221809     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2003.05.001     Document Type: Conference Paper

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