VPD/TXRF Analysis of Trace Elements on a Silicon Wafer

X-Ray Spectrometry

Volumn 28, Issue 6, 1999, Pages 451-455

  Yamagami, Motoyuki ^a   Nonoguchi, Masahiro ^a   Yamada, Takashi ^a   Shoji, Takashi ^a   Utaka, Tadashi ^a   Nomura, Shigeaki ^b   Taniguchi, Kazuo ^b   Wakita, Hisanobu ^c   Ikeda, Shigerou ^d  

^a RIGAKU CORPORATION   (Japan)

^b OSAKA ELECTRO COMMUNICATION UNIVERSITY   (Japan)

^c FUKUOKA UNIVERSITY   (Japan)

^d RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC ABSORPTION SPECTROMETRY; SENSITIVITY ANALYSIS; SILICON WAFERS; TRACE ANALYSIS; TRACE ELEMENTS; TRANSITION METALS;

ANALYSIS OF LIGHT ELEMENTS; ANGLE DEPENDENCE; HIGH-SENSITIVITY ANALYSIS; LOWER LIMITS OF DETECTIONS; ORDERS OF MAGNITUDE; TOTAL REFLECTION X-RAY FLUORESCENCE; TOTAL REFLECTION X-RAY FLUORESCENCE ANALYSIS; TRACES ELEMENTS; VAPOR-PHASE DECOMPOSITION; X-RAY FLUORESCENCE MEASUREMENT;

ATOMS;

EID: 0000253601     PISSN: 00498246     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4539(199911/12)28:6<451::AID-XRS381>3.0.CO;2-V     Document Type: Article

References (18)

1. T. Utaka, Y. Sako, S. Kojima, K. Iwamoto, H. Kohno and J. Atsumi, Adv. X-Ray Chem. Anal. Jpn. 23, 225 (1992).
2. T. Utaka, Y. Sako, H. Kohno, T. Shoji, K. Shimizu, K. Miyazaki and A. Shimazaki, Adv. X-Ray Chem. Anal. Jpn. 25, 203 (1994)
3. T. Shoji, T. Fukuda, M. Funabashi, T. Utaka, K. Miyazaki, T. Matsumura and A. Shimazaki, in Extended Abstracts of the 56th Autumn Meeting of the Japan Society of Applied Physics, Kanazawa, 1995, p. 615.
4. A. Shimazaki, H. Hiratsuka, Y. Matsushita and S. Yoshii, in Extended Abstracts of Conference on Solid State Devices and Materials, 1984, p. 281.
5. Y. Tanizoe, S. Sumita, M. Sano, N. Fujino and T. Shiraiwa, Bunseki Kagaku, 38, 177 (1989).
6. A. Shimazaki, Proc. ECS, Defects in Silicon II, p. 47 (1991).
7. J. Fucsko, S. S. Tan and M. K. Balazs, J. Electrochem. Soc. 140, 1105 (1993).
8. H. Matsunaga, M. Takenaka and N. Hirate, Bunseki 11, 936 (1997).
9. N. Streckfuss, L. Frey, G. Zielonka, F. Kroninger, C. Ryzlewicz and H. Ryssel, Fresenius J. Anal. Chem. 343, 765 (1991).
10. K. Tokushima, S. Mizouchi and T. Ochiai, in Extended Abstracts of the 43rd Spring Meeting of the Japan Society of Applied Physics, Kanazawa, 1996, p. 808.
11. K. Yakushiji and A. Mutoh, Adv. X-Ray Chem. Anal. Jpn. 28, 195 (1997).
12. H. Nagasawa, Y. Katoh and M. Enomoto, Bunseki Kagaku 44, 953 (1995).
13. H. Nagasawa and M. Enomoto, Bunseki Kagaku 46, 375 (1997).
14. M. B. Shabani, J. Electrochem. Soc. 143, 2025 (1996).
15. Y. Mori, K. Kubota, K. Shimano and T. Sakon, Anal. Sci. 14, 275 (1998).
16. M. Hourai, T. Naridomi, Y. Oka, K. Murakami, S. Sumita, N. Fujino and T. Shiraiwa, Jpn. J. Appl. Phys. 27, L2361 (1988).
17. Y. Mori, K. Shimanoe and T. Sakon, Anal. Sci. 11, 499 (1995).
18. J. L. de Vries and Bruno A. R. Vrebos, in Handbook of X-Ray Spectrometry, edited by R. E. Van Grieken and A. A. Markowicz, Chapt. 5, p. 304. Marcel Dekker, New York (1993).