Characterization and application of the vapor phase decomposition technique for trace metal analysis on silicon oxide surfaces

Surface and Interface Analysis

Volumn 24, Issue 8, 1996, Pages 511-516

  Hall, L H ^a   Sees, J A ^a   Schmidt, B L ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC SPECTROSCOPY; DECOMPOSITION; DEPOSITION; ETCHING; FURNACES; SILICON WAFERS; SOLUTIONS; STATISTICAL METHODS; SURFACES; TRACE ANALYSIS; VAPORS;

DROPLET SURFACE ETCHING; GRAPHITE FURNACE ATOMIC ABSORPTION SPECTROSCOPY; TOTAL REFLECTANCE X RAY FLUORESCENCE SPECTROSCOPY; VAPOR PHASE DECOMPOSITION;

SILICON COMPOUNDS;

EID: 0030215188     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199608)24:8<511::AID-SIA167>3.0.CO;2-T     Document Type: Article

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