Applications of aluminium nitride films deposited by reactive sputtering to silicon-on-insulator materials

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers

Volumn 35, Issue 8, 1996, Pages 4175-4181

  Bengtsson, S ^a   Bergh, M ^a   Choumas, M ^a   Olesen, Ch ^a   Jeppson, K O ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRIC INSULATORS; EXPERIMENTS; NITRIDES; SILICON; SPUTTER DEPOSITION;

ALUMINUM NITRIDE; SILICON-ON-INSULATOR MATERIALS;

SEMICONDUCTING FILMS;

EID: 0030206474     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.4175     Document Type: Article

References (21)