The expanding role of rapid thermal processing in CMOS manufacturing

Materials Science Forum

Volumn 573-574, Issue , 2008, Pages 3-19

  Nakos, Jim ^a   Shepard, Joe ^a  

^a IBM   (United States)

Author keywords

High k; Historical review; RTCVD; RTP; Silicide; Temperature control; Ultra fast ramp

Indexed keywords

BUSINESS MACHINES; CMOS INTEGRATED CIRCUITS; RAPID THERMAL PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICIDES; TEMPERATURE CONTROL;

FUNDAMENTAL LIMITATIONS; HIGH- K; HISTORICAL REVIEW; RTCVD; SEMICONDUCTOR MANUFACTURING; SEMICONDUCTOR PROCESSING TECHNOLOGIES; SEMICONDUCTOR TECHNOLOGY; ULTRA-FAST;

SILICON WAFERS;

EID: 45749148736     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.573-574.3     Document Type: Article

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