TiSi2 phase transformation characteristics on narrow devices

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 469-472

  Miles, Glen L ^a   Mann, Randy W ^a   Bertsch, John E ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Nucleation; Titanium silicide

Indexed keywords

CATALYSTS; IMPURITIES; INTERFACES (MATERIALS); MOLYBDENUM; NUCLEATION; PHASE TRANSITIONS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

BIMODAL RESISTANCE DISTRIBUTION; TITANIUM SILICIDE;

TITANIUM COMPOUNDS;

EID: 0030381897     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09023-2     Document Type: Article

References (7)

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7. Z. Ma and L.H. Allen, Kinetic mechanisms of the C49-tp-C54 polymorphic transformation in titanium disilicide thin films: a microstructure-scaled nucleation-mode transition, Phys. Rev. B. 49 (19) (1994) 501.